- Research Centre for Microtechnology
The Research Centre for Microtechnology focuses on the development of micro-technical production processes and components of Microsystems.
At present the focal points are on the following processes:
UV-lithography with thick lacquer coating (e.g. SU8) and DUV-Lithography (193 nm light source and mask aligner for high definition structures)
- numerical simulation of proximity and contact lithography
- numerical simulation of electron beam lithography
with Ni and Cu
Vacuum coating of wafers and other planar substrates using sputter deposition
with briefly pulsed (300 fs) solid body and excimer lasers (193 nm)
of crystalline substrates or polycrystalline silicon layers
scanning electron microscopy, with EDX and test dipping
- DWDM Design and simulation of passive optical components
These processes are also available as a service for external R&D partners.
Download: RCMT Handout (kb 322.5)