The Research Centre for Microtechnology focuses on the development of micro-technical production processes and components of Microsystems.

At present the focal points are on the following processes:

• Optical lithography

UV-lithography with thick lacquer coating (e.g. SU8) and DUV-Lithography (193 nm light source and mask aligner for high definition structures)

• numerical simulation of proximity and contact lithography

• numerical simulation of electron beam lithography

• Plasma etching

RIE of Si und dielectrics

• Micro-electroplating

with Ni and Cu

• Coating (Sputtering)

Vacuum coating of wafers and other planar substrates using sputter deposition

• Laser processing

with briefly pulsed (300 fs) solid body and excimer lasers (193 nm)

• Thermal oxidation

of crystalline substrates or polycrystalline silicon layers

• Analytics

scanning electron microscopy, with EDX and test dipping

• DWDM Design and simulation of passive optical components

These processes are also available as a service for external R&D partners.

Download: RCMT Handout (kb 322.5)