Infrastructure

In April 2005 the Research Center moved into an ISO class 5 clean room with approximately 240 m² of floor space. 150 m² of laboratory floor space with flow boxes are also available.

Lithography

EVG 101 resist processing system (lacquer unit, 2 hotplates, spray developer)
Süss MA6 / BA6 mask and bond aligner with 365 nm and 193 nm light source
Various ovens and hotplates

Laser Ablation:

Laser Structuring System: microSTRUCTvario von 3DMICROMAC

Lambda Physik LPF 220 excimer laser for 193 nm
Spirit - High Q Laser / Newport femtosecond laser
2 Newport xyz precision positioning instruments (100 nm)
Scanlab scanner
Vacuum chamber with spectrometer

Electroplating:

Ramgraber electroplating units for Ni and Cu

Sputter units:

Matvac 320
Oerlikon LLS EVO

Etching:

Adixen AMS 100 DSE plasma etching unit
Wet etching bench with 4 etching basins

Thermal Oxidation

Programmable diffusion oven - model PEO 604 (ATV Technologie GmbH, Germany)

Analytics

Scanning Electron Microscope: FEI XL-30 ESEM FEG

X-ray fluorescence: Fischerscope X-RAY XAN

White light interferometry: VEECO  Wyko NT1100

Sample preparation

Manual wet cut-off machine: Struers Labotom-3

Automatic hot-mounting press: Struers LaboPress-3

Grinding and polishing machine: Struers LaboPol-5

Lapping and polishing machine: Logitech PM5

Linear precision saw: Buehler Isomet 4000