MAGIC - MAskless lithoGraphy for IC manufacturing
The project supports the development of Mask-Less Lithography (ML2) based on multi-electron-beam principles developed by two European companies: MAPPER Lithography B.V (the Netherlands) and IMS Nanofabrication AG (Austria). The model of the ML2 option in association with the high resolution capability of the electron beam lithography and a reasonable throughput target represents an attractive alternative for the micro-lithography and is supported by some key CMOS manufacturers around the world.
Program
EU FP 7
Project Partners
CEA LETI, Grenoble, France
Delong Instruments, Brno, Czech Republic
FhG-HHI, Berlin, Germany
FhG-ISIT, Itzhoe, Germany
FhG-IZM, Berlin, Germany
FhG-CNT, Dresden, Germany
FUJI FILM Electronics Materials (Europe) S.A.S, Belgium
IMS Nanofabrication AG, Vienna, Austria
IMS-CHIPS, Stuttgart, Germany
KLA-Tencor Corporation, Migdal Ha'emek, Israel
MAPPER Lithography B.V., Delft, Netherland
STMicroelectronics, Genf, Switzerland
SYNOPSYS International Ltd., Ireland
