Home / FHV Research / Microtechnology / Projects / MALS - Mask-Aligner Lithography Simulation

MALS - Mask-Aligner Lithography Simulation

 

Program

Partially funded by Bayrische Forschungsstiftung.

 

Project Partners

Fraunhofer IISB, Erlangen Germany

GenISys GmbH, Taufkirchen, Germany

Suss MicroTec, Garching, Germany

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  Contact


Vorarlberg University of Applied Sciences
Microtechnology
Dipl.Ing. (FH) Stefan Partel, M.Sc.
Hochschulstrasse 1
6850 Dornbirn
Austria

T +43 (0)5572 792 7204
stefan.partel@fhv.at

  Contact


Vorarlberg University of Applied Sciences
Microtechnology
Hochschulstrasse 1
6850 Dornbirn
Austria

T +43 (0)5572 792 3500
F +43 (0)5572 792 9501
mikrotechnik@fhv.at