Technical Equipment

In April 2005 the Research Center moved into an ISO class 5 clean room with approximately 240 m² of floor space. 150 m² of laboratory floor space with flow boxes are also available.

Lithography

• EVG 101 resist processing system (lacquer unit, 2 hotplates, spray developer)
• Süss MA6 / BA6 mask and bond aligner with 365 nm and 193 nm light source
• Various ovens and hotplates

Laser Ablation

• Laser Structuring System: microSTRUCTvario von 3DMICROMAC
• Lambda Physik LPF 220 excimer laser for 193 nm
• Spirit - High Q Laser / Newport femtosecond laser
• 2 Newport xyz precision positioning instruments (100 nm)
• Scanlab scanner
• Vacuum chamber with spectrometer

Electroplating

• Ramgraber electroplating units for Ni and Cu
   

Sputter units

• Oerlikon LLS EVO
   

Etching

• Adixen AMS 100 DSE plasma etching unit
• Wet etching bench with 4 etching basins
   

Thermal Oxidation

• Programmable diffusion oven - model PEO 604 (ATV Technologie GmbH, Germany)
   

Analytics

• Scanning Electron Microscope: JEOL JSM-7100F
• X-ray fluorescence analysis: EDAX TEAM Enhanced
• White light interferometry: VEECO Wyko NT1100

Sample preparation

• Manual wet cut-off machine: Struers Labotom-3
• Automatic hot-mounting press: Struers LaboPress-3
• Grinding and polishing machine: Struers LaboPol-5
• Lapping and polishing machine: Logitech PM5
• Linear precision saw: Buehler Isomet 4000