In April 2005 the Research Center moved into an ISO class 5 clean room with approximately 240 m² of floor space. 150 m² of laboratory floor space with flow boxes are also available.
Lithography
- EVG 101 resist processing system (lacquer unit, 2 hotplates, spray developer)
- Süss MA6 / BA6 mask and bond aligner with 365 nm and 193 nm light source
- Various ovens and hotplates
Laser Ablation
- Laser Structuring System: microSTRUCTvario von 3DMICROMAC
- Lambda Physik LPF 220 excimer laser for 193 nm
- Spirit - High Q Laser / Newport femtosecond laser
- 2 Newport xyz precision positioning instruments (100 nm)
- Scanlab scanner
- Vacuum chamber with spectrometer
Sputter units
Etching
- Adixen AMS 100 DSE plasma etching unit
- Wet etching bench with 4 etching basins
Thermal Oxidation
- Programmable diffusion oven - model PEO 604 (ATV Technologie GmbH, Germany)
Analytics
- Scanning Electron Microscope: JEOL JSM-7100F
- X-ray fluorescence analysis: EDAX TEAM Enhanced
- White light interferometry: VEECO Wyko NT1100
Sample preparation
- Manual wet cut-off machine: Struers Labotom-3
- Automatic hot-mounting press: Struers LaboPress-3
- Grinding and polishing machine: Struers LaboPol-5
- Lapping and polishing machine: Logitech PM5
- Linear precision saw: Buehler Isomet 4000
More information about the Research Centre for Microtechnology