Publikationen, Vorträge und Poster
P.Hudek and P.Choleva, “Lithography– Resist- Etching Process Chain in the M(N)EMS Fabrication”, GenISys BEAMeeting 2013 Freiburg, March, 14.-15.,2013 Technical Workshop& Discussion, IAF Fraunhofer, Freiburg, Germany.
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D. Seyringer und J. Edlinger: Photonik – Aktivitäten an der FH Vorarlberg,
Photonik-Austria, 28 February 2013, Wien
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D.Seyringer and M.Bielik: AWG-Parameters: new software tool to design arrayed waveguide gratings, SPIE Photonics West 2013, 2 to 7 February 2013, San Francisco (USA).
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A.Kuzma, F.Uherek, E.Koza, D.Seyringer, G.Patassy, B.Pikus, J.Sukula, M.Mucka, J.Chovan, Vyroba a vyuzitie Braggovych mriezok v optickych vlaknach, Seminar: NANO A SMART TECHNOLOGIE, ILC Bratislava, 12. December 2012
G.Vanko, J. Zehetner, P. Choleva, T. Lalinský, P. Hudek: Laser Ablation: A supporting technique to micromachining of SiC, 2012 IEEE International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 11 to 15 November 2012, Smolenice (Slovakia), Published in IEEE Electron Devices (2013).
DOI: 10.1109/ASDAM.2012.6418518
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D.Seyringer, F.Uherek, J.Chovan and A.Kuzma: Design, Simulation and Evaluation of AWG Based Demultiplexers, 2012 IEEE International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 11 to 15 November 2012, Smolenice (Slovakia), Published in IEEE Electron Devices (2013).
DOI: 10.1109/ASDAM.2012.6418537
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D.Seyringer: Vacuum in Photonics, 15th school of Vacuum Technology: Vacuum and Progressive Materials, 8 to 11 November 2012, Štrbské Pleso, Slovakia (invited talk).
J.Chovan, A.Kuzma, F.Uherek, D.Seyringer, Navrh a simulacia fotonickych senzorov, Konferenz: Elektrotechnika, informatika a telekomunikacie 2012, Bratislava, 9 to 12 October 2012.
Published in : Journal of Electrical and Power Engineering, ISBN: 978-80-970493-4-8.
S.Partel, G.A.Urban, K.Motzek: Simulation model validation of two common i-line photoresists, 38th International Conference on Micro and Nano Engineering, 16 to 20 September 2012, Toulouse (France), will be published in Microelectronic Engineering (2013).
Gabriel Vanko, Peter Hudek, Jaroslav Dzuba, Pavlina Choleva, Martin Vallo, Johann Zehetner, Ivan Rýger, Tibor Lalinský: Bulk micromachining of SiC substrate for MEMS sensor applications, 38th International Conference on Micro and Nano Engineering, 16 to 20 September 2012, Toulouse (France), will be published in Microelectronic Engineering (2013).
P.Choleva: Development of microtechnical production processes and components of Microsystems, Beyond Everest project FP7, University of Sofia, Faculty of chemistry, 17 July 2012, Sofia, Bulgaria (invited talk).
D.Seyringer: Design and Simulation of 128-channel 10 GHz AWG for Ultra-Dense Wavelength Division Multiplexing, ICTON 2012 (International Conference on Transparent Optical Networks), 2 to 5 July 2012, Warwick, U.K.
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DOI: 10.1109/ICTON.2012.6253804
S.Partel, M.Mayer and K.Motzek: In-situ measurement and characterization of photoresists during development, SPIE Newsroom, 1 May 2012,
J.-N.Tisserant, R.Hany, S.Partel, G.-L.Bona, R.Mezzenga and J.Heier: Dewetting-driven hierarchical self-assembly of small semiconducting molecules, Soft Matter, 8, p. 5804-5810 (2012).
DOI: 10.1039/C2SM25288K
Received 8 February 2012, Accepted 20 March 2012
D.Seyringer, F.Uherek, J.Chovan, P.Schmid, M.Bielik and J.Edlinger: Design and Simulation in Photonics, IFME 2011 (International Forum of Mechanical Engineering), FHV, Dornbirn, 24 to 26 November 2012
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A.Kuzma, J.Chovan, F.Uherek, D.Seyringer: Design and Simulation of Planar Passive Optical MMI Splitters, 23th conference and exhibition „Optical communication 2011“, Prag, 20 to 21 October 2011, ISBN 978-80-86742-31-1.
S.Partel, M.Mayer, P.Hudek, C.Dinçer, J.Kieninger, G.A.Urban, K.Motzek, L.Matay: Fabrication process development for a high sensitive electrochemical IDA sensor, MNE 2011 (Micro- and Nano Engineering Conference), Berlin, Germany, 19 to 23 September 2011.
Published in Microelectronic engineering 97 (2012) Pages 235-240.
http://dx.doi.org/10.1016/j.mee.2012.03.028
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K.Motzek, S.Partel, A.Bramati, U.Hofmann, N.Unal, M.Hennemeyer, M.Hornung, A.Heindl, M.Ruhland, A.Erdmann, P.Hudek: Mask Aligner Lithography Simulation – From Lithography Simulation to Process Validation, MNE 2011 (Micro- and Nano Engineering Conference) Berlin, Germany, 19 to 23 September 2011.
Published in: Microelectronic Engineering, Volume 98 (2012) 121-124,
http://dx.doi.org/10.1016/j.mee.2012.07.076
T.Lalinský, P.Hudek, G.Vanko, P.Choleva, M.Vallo, L.Matay, I.Kostič, M.Držík: Micromachined pressure sensors based on AlGaN/GaN circular HEMT sensing devices, MNE 2011 (Micro- and Nano Engineering Conference), Berlin, Germany, 19 to 23 September 2011.
Published in: Microelectronic Engineering, Volume 98, October 2012, Pages 578-581
http://dx.doi.org/10.1016/j.mee.2012.06.014
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J.Chovan, F.Uherek, R.Kurinec, A.Satka, J.Pavlov, D.Seyringer: Temperature characterization of passive optical components for WDM-PON FTTx, Advances in electrical and electronic engineering: Optics and optoelectronics, vol. 2, Nr. 2, September 2011, p. 143-149.
D.Seyringer, P.Schmid: A new software tool is developed to evaluate the measured/simulated transmission characteristics of optical multilexers/ demultiplexers, SPIE OSD11 (Optical system design Conference 2011), Marseille, France, 5 to 8 September 2011.
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D.Seyringer, M.Bielik, M.Kytka: Introduction of a new software tool to design arrayed waveguide gratings, 16th International Conference on Applied Physics of Condensed Matters, APCOM 2011, Nový Smokovec, High Tatras, Slovakia, 22 to 24 June 2011. Page 122
P.Hudek: Modeling of heating & fogging effect in e-beam lithography, BEAMeeting 2011 Paris, Laboratoire de Photonique et de Nanostructures, Centre National de la Recherche Scientifique - UPR2, Marcoussis, 31 March 2011.
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S.Stroj: Von Einstein's Koeffizienten zur Blechbearbeitung - eine kleine Geschichte des Lasers, VTT - Vorarlberger Technik Tag 2011, FH Vorarlberg, Dornbirn, Austria, 18 January 2011.
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S.Hermann, T.Dezhdar, N.Harder, R.Brendel, M. Seibt and S.Stroj: Impact of surface topography and laser pulse duration for laser ablation of solar cell front side passivating SiNx layers,
Published in:J. of Appl. Phys., 108, 114514 (2010).
L.Matay, R.Andok, V.Barák, A.Ritomský, A.Konečníková, I.Kostič, S.Partel, P.Hudek: Material optimization of the alignment marks for the EBDW lithography, Presented at the 8th IEEE International Conference on Advanced Semiconductor Devices and Micro-systems ASDAM ’10 (25 October 2010) Smolenice (Slovakia).
Published in: IEEE Electron Dev. Society (2010).
D.Seyringer: Low Loss and High Uniformity Multimode Interference Splitter Operating in a Wide Wavelength Band, ICOCN 2010 - The 9th International Conference on Optical Communications and Networks, 24 to 27 October 2010, Nanjing, China.
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P.Hudek: High-Resolution Micro- and Nano-Lithography, Erwin Schrödinger Kolloquium 2010, University of Vienna, Vienna, Austria, 28 June 2010.
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L.Matay, R.Andok, A.Ritomský, V.Barák, I.Kostič, S.Partel, P.Hudek: Alignment Marks for the EBDW Lithography, 16th International Conference on Applied Physics of Condensed Matters, APCOM 2010, Mala Lucivna, Slovak Republic, 16 to 18 June 2010.
Published in: Proc.16th International Conference on Applied Physics of Condensed Matters
ISBN 978-80-227-3307-6.
S.Stroj: Die Herstellung von Mikrostrukturen mittels selektiver Laserablation mit ultrakurzen Laserpulsen und deep-UV Strahlquellen, DOMIT 2010, 5. Dornbirner Mikrotechniktage, Dornbirn, Austria, 8 to 9 June 2010.
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D.Seyringer: Improvement of the Channel Crosstalk in Narrow Channel Spacing Arrayed Waveguide Gratings Applying Specially Shaped Couplers, Photonics Europe 2010, Brussels, Belgium, 12 to 16 April 2010.
Published in: Proceedings of Photonics Europe 2010
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P.Choleva, S.Partel, R.Mathies: Mikrogalvanik in dicken SU8 Strukturen, 4. Forschungsforum der Österreichischen Fachhochschulen 2010, Pinkafeld, Austria, April 7 to 8, 2010.
Published in: Fachhochschulstudiengänge Burgenlang GesmbH, ISBN: 978-3-200-01809-9.
S. Partel, S. Zoppel, P. Hudek, A. Bich, U. Vogler, M. Hornung, R. Voelkel: Contact and Proximity Lithography using 193nm Excimer Laser in Mask Aligner, MNE’09 - International Micro- and Nano-Engineering Conference, Ghent, Belgium, 28 September to 1 October 2009.
Published in: Microelectronic Engineering 87 (2010) 936-939
K. Motzek, A. Bich, A. Erdmann, M. Hornung, M. Hennemeyer, B. Meliorisz, U. Hofmann, N. Unal, R. Voelkel, S. Partel, P. Hudek: Optimization of illumination pupils and mask structures for proximity printing, MNE’09 - International Micro- and Nano-Engineering Conference, Ghent, Belgium, 28 September 28 to 1 October 2009.
Published in: Microelectronic Engineering 87 (2010) 1164-1167
G. Mozdzen, F. Rüdenauer, W. Costin, P. Sattler, P. Hudek:Ultra low voltage SEM for high accuracy measurements of CD/LWR/LER, 9th Multinational Conference on Microscopy 2009 (MC2009), Graz, Austria, 30 August to 4 September 2009
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L. Matay, R. Andok, A. Bencurová, A. Ritomský, I. Kostic, S. Partel, P. Hudek: Preparation method of large and complex defect-free chips directly-written by ZBA 21 e-beam tool, 15th International Conference on Applied Physics of Condensed Matter (APCOM 2009), Liptovský Ján, Slovakia, 24 to 26 June 2009
Published in: 15th International Conference on Applied Physics of Condensed Matter (APCOM 2009) ISBN 978-80-554-0057-0.
P. Hudek: E-beam lithography: overview, e-beam systems and writing strategies, resolution limits and pattering fidelity issues, resist for e-beam lithography
E-beam lithography: modeling, pattern degrading effects and exposure optimization, future developments and novel concepts, multi-beam techniques, 5th Fraunhofer IISB Lithography Simulation Course, Erlangen, Germany, 4 to 5 June 2009.
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C. Riesch, E. K. Reichel, A. Jachimowicz, J. Schalko, P. Hudek, B. Jakoby, F. Keplinger: A suspended plate viscosity sensor featuring in-plane vibration and piezoresistive readout
Published in: J. Micromech. Microeng. 19 (2009) 075010 (10pp)
F.Hämmerle: Elektrodynamische Simulation miniaturisierter RFID-Spulen, VTT - Vorarlberger Technik Tag 2009, FH Vorarlberg, Dornbirn, Austria, 27 January 2009.
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FZMT: System- und Prozessanalyse durch Simulation, VTT - Vorarlberger Technik Tag 2009, FH Vorarlberg, Dornbirn, Austria, 27 January 2009.
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H.P.Huber, F.Hernberger, S.Kery and S.Zoppel: Selective structuring thin-film solar cells by ultrafast laser ablation
Published in: Proceedings of SPIE - The International Society of Optical Engineering 6881 (2008).
L.Matay, R.Andok, V.Barak, A.Konecnikova, I.Kostic, S.Partel, P.Hudek: New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool, The 7th Int’l Conf. on Advanced Semicond. Devices and Microsystems (ASDAM), Smolenice, Slovakia, 12 to 16 October 2008.
Published in: IEEE Electron Dev. Society.
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M.Rosenauer, M.Spitzbart, S.Zoppel, M.Vellekoop: Ultra Rapid High Quality Prototyping for Optical Microfuidic Analysis Devices, EUROSENSORS 2008, Dresden, Germany, 7 to 10 September 2008.
Published in: Proc. EUROSENSORS XXII, ISBN 978-3-00-025217-4, Paper Nr. 061, 4 S.
A.Rigler, Ch.Wagner, P.Svasek, A.Jachimowicz, P.Hudek, M.Kraft, M.J.Vellekoop: Improved lamination micromixer with wedge shaped inlet channels for IR spectroscopy, EUROSENSORS 2008, Dresden, Germany, 7 to 10 September 2008.
Published in: Proc. EUROSENSORS, ISBN 978-3-00-025217-4, pp 577-580.
L.Matay, R.Andok, S.Partel, P.Hudek: Large structured arrays with high pattern density, APCOM 2008, Liptovský Ján, Slovakia, 25 to 27 June 2008.
Published in: Proc. 4th Int’l Conf. on Applied Physics of Condensed Matter (APCOM 2008), (Session 5B, J.Vajda, M.Weis, M.Vanco, E.Psotka, Editors), ISBN 978-80-227-2902-4, p.142-145.
P.Choleva, S.Partel, R.Mathies: Mikrogalvanik in tiefen SU8 Strukturen, Dornbirner Mikrotechniktage, Dornbirn, Austria, 27 to 28 May 2008.
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T.Wehlus, T.Hackl, S.Zoppel, J.Edlinger, T.Koerner, H.Karl, W.Brütting, B.Stritzker:
Ultrashort Pulsed Laser Structuring of Garnet Planar Waveguides for Organic-Inorganic Hybride Materials, E-MRS Spring meeting, Strasbourg, France, 26 to 30 May 2008.
M.Rosenauer, S.Zoppel, M.Vellekoop: A Novel Microfluidic Sensor System Fabricated by SU-8 Femtosecond Pulsed Laser Prototyping, International Spring Seminar on Electronics Technology (ISSE), Budapest, Hungary, 7 to 11 May 2008.
Published in: Abstract Proceedings - Reliability and Life-time Predition, (2008), ISBN: 978-963-06-4915-5; p. 240-241.
S.Partel, L.Matay, P.Hudek: Hochauflösende Kontaktlithographie, 2-te Forschungsforum der österreichischen Fachhochschulen FHK Wels, Austria, 26 to 27 March 2008.
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S.Zoppel: Mikrostrukturierung von Dielektrika und Halbleitern mit ultrakurzen Laserpulsen, 2-te Forschungsforum der österreichischen Fachhochschulen FHK Wels, Austria, 26 to 27 March 2008.
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D.Seyringer: Mikrotechnik-Aktivitäten in Vorarlberg, PLATON Nanophotonics Day 2008, Vienna, Austria, 28 March 2008.
L.Pain, B.Icard, S.Tedesco, B.Kampherbeek, G.Gross, C.Klein, H.Loeschner, E.Platzgummer, R.Morgan, S.Manakli, J.Kretz, C.Hohle, K.-H.Choi, F.Thrum, E.Kassel, W.Pilz, K.Keil, J.Butschke, M.Irmscher, F.Letzkus, P.Hudek, A.Paraskevopoulos, P.Ramm, J.Weber: MAGIC: a European program to push the insertion of maskless lithography, Emerging Lithographic Technologies XII, San Jose, CA, USA, 26 February 2008.
Published in: Proc. SPIE Vol. 6921, Frank M. Schellenberg, Editor (2008) 69211S.
B.Meliorisz, S.Partel, T.Schnattinger, T.Fühner, A.Erdmann, P.Hudek: Investigation of high-resolution contact printing, MNE’07 - 33rd International Conference on Micro- and Nano-Engineering Conference, Copenhagen, Denmark, 23 to 26 September 2007.
Published in: Microelectronic Engineering 85, Issues 5-6, 744 (2008).
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S.Zoppel, S.Partel, P.Choleva, M.Lederer, G.A.Reider: Selective femtosecond Laser Microstructuring of photoresists and TCO, 26th ICALEO, Orlando, Fl, 29 October to 1 November 2007.
Show PDF: ICALEO'07
D.Andrijasevic, W.Smetana, S.Zoppel, W.Brenner: An investigation on development of MEMS in LTCC by embossing technique, 4M 2007 - 3rd International Conference on Multi-Material Micro Manufacture, Borovets, Bulgaria, 3 to 5 October 2007.
Published in: Proc. of 4M 2007 (Edited by Stefan Dimov, Wolfgang Menz and Yuli Toshev, Organized by: FP6 4M Network of Excellence Whittles Publishing), CRC Press ISBN 978-1904445-53-1, p.143-146 (2007).
S.Partel, S.Zoppel, G.Hairer, G.Stangl, L.Matay, P.Hudek: Development of a high resolution UV contact lithography process for the fabrication of interdigitated electrode arrays, NanoEurope 2007, Fair & Conference, St. Gallen, Switzerland, 11 to 13 September 2007.
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S.Zoppel, S.Partel, P.Choleva, P.Hudek, H.Huber, M.Lederer, J. Aus der Au, G.A.Reider: Micro structuring of photoresist with femtosecond laser pulses, CLEO Europe 2007 – Conference on lasers and electro-optics, Munich, Germany, 17 to 22 June 2007.
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S.Zoppel, S.Partel, J.Zehetner, P.Hudek, G.A.Reider: Selective laser ablation of photoresists for MEMs devices, LPM 2007 – 8th International Symposium on Laser Precision Microfabrication, Vienna, Austria, 23 to 27 April 2007.
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R.Merz, P.Hudek, S.Partel, R.Holly, K.Hingerl, H.Seyringer: Herstellung drei-dimensionaler Siliziumkeile zur optischen Kopplung von Glasfasern und integrierten optischen Wellenleitern, FFH2007, Salzburg, Austria, 11 to 12 April 2007.
Published in: Erstes Forschungsforum der Österreichischen Fachhochschulen
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J.Nicolics, L.Musiejovsky, J.Steurer, I.Giouroudi, H.Hauser, M.Mündlein, S.Zoppel, J.Zehetner: Laser Welding Process Optimization for the Production of Giant Magnetoimpedance Magnetic Field Sensors
Published in: Sensor Letters, Vol.5, No.1, pp. 204-206 (2007).
P.Hudek, U.Denker, D.Beyer, N.Belic, H.Eisenmann: Fogging effect correction method in high-resolution electron beam lithography, MNE’06 - International Micro- and Nano-Engineering Conference, Barcelona, Spain, 17 to 20 September 2006.
Published in: Microelectronic Engineering, Vol.84, 814-817 (2007).
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S.Zoppel, H.Huber, G.A.Reider: Selective ablation of thin Mo and TCO films with femtosecond laser pulses for structuring thin film solar cells
Published in: Appl. Phys. A 89(1), 161-163 (2007)
S.Zoppel, J.Zehetner, G.A.Reider: Two color laser ablation: Enhanced yield, improved machining
Published in: Appl. Surf. Scie. 253(19), 7692-7695 (2007)
R.Holly, K.Hingerl, R.Merz, P.Hudek: Fabrication of silicon 3D taper structures for optical fibre to chip interface, MNE’06 - International Micro- and Nano-Engineering Conference, Barcelona, Spain, 17 to 20 September 2006.
Published in: Microelectronic Engineering 84, 1248-1251 (2007).
V.Wieger, S.Zoppel, E.Wintner: Ultrashort Pulse Laser Osteotomy,
Published in: Laser Physics, ISSN 1054-66X, Vol.17, No.4, pp.438-442 (2007).
D.Andrijasevic, W.Smetana, J.Zehetner, S.Zoppel, W.Brenner: Aspects of micro structuring Low Temperature Cofired Ceramic (LTCC) for realisation complex 3D objects by embossing, MNE’06 - Micro and Nano Engineering Conference, Barcelona, Spain, 17 to 20 September 2006.
Published in: Microelectronic Engineering, Vol.84(5-8), 1198-1201 (2007)
M.Farsari, G.Filippidis, S.Zoppel, G.A.Reider, C.Fotakis: Micromachining of Silicon Carbide using femtosecond lasers, 8th Conference on laser ablation, Banff, Canada, 2005.
Published in: M Farsari et al 2007 J. Phys.: Conf. Ser. 59 84-87
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S.Zoppel, D.Gray, M.Farsari, R.Merz, G.A.Reider, C.Fotakis: UV-femtosecond laser ablation of SrTiO3 single crystals, 8th Conference on laser ablation, Banff, Canada, 2005.
Published in: S Zoppel et al 2007 J. Phys.: Conf. Ser. 59 610-615
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E.Lausecker, W.Schwinger, I.Bergmair, M.Mühlberger, R.Schöftner, S.Partel, P.Hudek: Fabrication of 4" PDMS stamps and large area sub-µm µCP, Workshop of the Austrian Networks for Nanosciences and Nanotechnology, Danube-University Krems, Austria, 21 to 22 November 2006.
Published in: WORKSHOP of the AUSTRIAN NETWORKS for NANOSCIENCES and NANOTECHNOLOGY
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S.Zoppel, M.Lederer, J.Smolenski, H.Huber, R.Braunschweig, D.Kopf: Compact Ultrafast Lasers: Thin film structuring for photovoltaic applications, ICALEO 2006 - 25th International Congress on Applications of Lasers Electro-Optics, Scottsdale, Arizona, 30 October to 2 November 2006.
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R.Holly, K.Hingerl, R.Merz, P.Hudek, S.Neve, S.Partel, T.Auer: Fabrication of silicon vertical taper structures for fiber to chip coupler by KOH anisotropic etching, GMe-Workshop 2006 (im Rahmen der Vienna-Tech 2006), Reed Messe Wien, Austria, 13 October 2006.
Show Paper: GMe Paper
P.Hudek, D.Beyer, U.Denker: Writing and exposure optimization in maskless electron beam lithography (Invited presentation), 4th IISB Lithography Simulation Workshop, Hersbruck, Germany, 29 September to 1 October 2006.
Show PDF: LithoSimulWorkshop'06
V.Wieger, S.Zoppel, and E.Wintner: Ultra-short pulse laser osteotomy, 15th International Laser Physics Workshop (LPHYS’06), Lausanne, Switzerland, 24 to 28 July 2006.
S.Zoppel, H.Zehetner, L.Musiejovsky, H.Hauser and J.Nicolics: Laser Micromachining for GMI-Sensors, EMSA 2006 - 6th European Conference on Magnetic Sensors and Actuators, Bilbao, Spanien, 3 to 5 June 2006.
S.Zoppel, J.Zehetner, G.A.Reider: Two color laser ablation: enhanced yield, improved quality, E-MRS - European Materials Research Society Spring meeting 2006, Nizza, Frankreich, 29 May to 2 June 2006.
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S.Zoppel, S.Partel, J.Nicolics, G.A.Reider, J.Zehetner: Laserablation und ihre Anwendung in der Mikrotechnik, Dornbirner Mikrotechniktage, Dornbirn, Austria, 30 May to 1 June 2006.
Show PDF: Präsentation
S.Partel, S.Zoppel, P.Hudek, T.Auer , J.Zehetner, W.Smetana , H.Homolka , B.Balluch: Entwicklung zusammenhängender Fertigungsschritte für optische, elektrische und fluidische Mikrosysteme, Dornbirner Mikrotechniktage, Dornbirn, Austria, 30 to 31 May 2006.
Show PDF: Lecture
H.Huber, S.Zoppel, M.Lederer, J.Smolenski, R.Braunschweig, D.Kopf: High Repetition Rate Micromachining of Dielectrics and Ceramics with Ultrafast Lasers (Invited Lecture), PHAST 2006 – Photonic applications system technologies, Long Beach, CA, USA, 22 to 25 May 2006.
H.Huber, S.Zoppel, J.Zehetner, R.Merz, M.Lederer, W.Seitz, D.Kopf: High Repetition Rate Ultrafast Lasers and their Applications in Micromachining, LAMP 2006 - The 4th International Congress on Laser Advanced Materials, Kyoto, Japan, 16 to 19 May 2006,
P.Hudek: High-Resolution Patterning in the Micro- and Nano-Technology using Charged Particles (Invited Lecture), Christian Doppler Laboratory of Surface Optics, Institute of Semiconductor and Solid State Physics, Johannes Kepler University Linz, Austria, 22 May 2006.
A.Yousif, M.Strassl, V.Wieger, S.Zoppel, E.Wintner: Oral Applications of Ultra-Short Laser Pulses - a New Approach for Gentle and Painless Treatment?
Published in: Proc. of the SPIE, High Power Laser ablation VI, ISBN 0-8194-6342-6, Vol.6261 (2006).
M.Drzik, H.Loeschner, W.Fallmann, P.Hudek, I.W.Rangelow, Y.Sarov, T.Lalinsky, J.Chlpik: Mechanical characterization of membrane like microelectronic components (Invited Poster), MNE 2005 - 31st Int’l Conf. on Micro- and Nano-Engineering, Vienna, Austria, 19 to 22 September 2005.
Published in: Microelectronic Engineering 83, p.1036-1042 (2006).
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P.Hudek, D.Beyer: Exposure optimization in high-resolution electron-beam lithography, MNE 2005 - 31st Int’l Conf. on Micro- and Nano-Engineering, Vienna, Austria, 19 to 22 September 2005.
Published in: Microelectronic Engineering 83,780-783 (2006).
S.Zoppel, M.Farsari, R.Merz, J.Zehetner, G.Stangl, G.A.Reider, C.Fotakis: Laser micro machining of 3C-SiC single crystals, MNE 2005 - 31st Int’l Conf. on Micro- and Nano-Engineering, Vienna, Austria, 19 to 22 September 2005.
Published in: Microelectronic Engineering 83,780-783 (2006).
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P.Hudek: Hochauflösende Mikrostrukturierung mittels E-Strahl-Lithographie und Trockenätzen (Invited Lecture), Forschungszentrum Karlsruhe GmbH, Institut für Mikrostrukturtechnik, Germany, 8 November 2005.
U.Denker, P.Hudek: Proximity Correction for High Resolution Direct Write, 3rd Int’ Mask Workshop at IMS Chips, Stuttgart, Germany, 28 October 2005.
Show PDF: Lecture
S.Zoppel, J.Zehetner, G.A.Reider: Improved picosecond laser ablation with second harmonic seeding, 5th International Conference on Photonics, Devices and Systems, Prague, Czech Republic, 8 to 11 June 2005.
Published in: Proceedings of SPIE, the International Society for Optical Engineering ISSN 0277-786X CODEN PSISDG.
J.Zehetner, T.Auer, H.Duelli, P.Hudek, R.Merz, S.Neve, S.Partel, H.Wadlegger, S.Zoppel G.Stangl: Laserbearbeitung am Forschungszentrum Mikrotechnik der FH Vorarlberg, Dornbirner Mikrotechniktage, Dornbirn, Austria, 22 to 23 March 2005.
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P.Hudek: Elektronenstrahl Lithographie - Nanostrukturierung mit Optimierung (Invited Lecture), ARC Seibersdorf Research GmbH, Nano-Systemtechnologien, Tech Gate Vienna, 28 February 2005.
J.Zehetner, S.Zoppel, R.Merz, H.Huber: Neue Pikosekundenlaserkonzepte und ihre Anwendungen, Laser in der Elektronikproduktion & Feinwerktechnik, Tagungsband: LEF 2005, Hrsg.: M.Geiger, S.Polster, Meisenbach, Bamberg, 2005.
M.Farsari, G.Filippidis, S.Zoppel, G.A.Reider and C.Fotakis: Efficient femto second laser micromachining of bulk 3C-SiC
Published in: J. Micromech. Microeng. 15, p.1786-1789 (2005).
S.Zoppel, R.Merz, J.Zehetner, G.A.Reider: Enhancement of laser ablation yield by two color excitation
Published in: Applied Physics A 81, 847-850 (2005).
S.Zoppel, D.Gray, M.Farsari, R.Merz, G.A.Reider, C.Fotakis: Elimination of cracking during UV laser ablation of SrTiO3 single crystals by employing a femto second laser
Published in: Applied Surface Science 252, 1910-1914, (2005).
D.Beyer, P.Hudek, O.Fortagne, T.Groves, J.Gramss: Writing Nano-Imprint Templates by Shaped E-beam Lithography, 3rd International Conference on Nanoimprint und Nanoprint Technology, Vienna, Austria, December 2004.
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G.Stangl, G.A.Reider, S.Zoppel, W.Friza, A.Jarisch: Overview on Ablation Techniques at wavelengths of 193 and 248 nanometers, 7th International Conference on Laser Ablation, Kreta, Greece, October 2003.
