Publikationen, Vorträge und Poster

G. Mozdzen, F. Rüdenauer, W. Costin, P. Sattler, P. Hudek:Ultra low voltage SEM for high accuracy measurements of CD/LWR/LER, 9th Multinational Conference on Microscopy 2009 (MC2009), Graz, Austria, August 30 - September 4, 2009

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L. Matay, R. Andok, A. Bencurová, A. Ritomský, I. Kostic, S. Partel, P. Hudek:   Preparation method of large and complex defect-free chips directly-written by ZBA 21 e-beam tool, 15th International Conference on Applied Physics of Condensed Matter (APCOM 2009), Liptovský Ján, Slovakia, June 24–26, 2009

Published in: 15th International Conference on Applied Physics of Condensed Matter (APCOM 2009) ISBN 978-80-554-0057-0.

P. Hudek: E-beam lithography: overview, e-beam systems and writing strategies, resolution limits and pattering fidelity issues, resist for e-beam lithography

E-beam lithography: modeling, pattern degrading effects and exposure  optimization, future developments and novel concepts, multi-beam techniques, 5th Fraunhofer IISB Lithography Simulation Course, Erlangen, Germany, June 4-5, 2009.

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C. Riesch, E. K. Reichel, A. Jachimowicz, J. Schalko, P. Hudek, B. Jakoby, F. Keplinger: A suspended plate viscosity sensor featuring in-plane vibration and piezoresistive readout

Published in: J. Micromech. Microeng. 19 (2009) 075010 (10pp)

F.Hämmerle: Elektrodynamische Simulation miniaturisierter RFID-Spulen, VTT - Vorarlberger Technik Tag 2009, FH Vorarlberg, Dornbirn, Austria, January 27, 2009.

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FZMT: System- und Prozessanalyse durch Simulation, VTT - Vorarlberger Technik Tag 2009, FH Vorarlberg, Dornbirn, Austria, January 27, 2009.
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H.P.Huber, F.Hernberger, S.Kery and S.Zoppel: Selective structuring thin-film solar cells by ultrafast laser ablation

Published in: Proceedings of SPIE - The International Society of Optical Engineering 6881 (2008).

L.Matay, R.Andok, V.Barak, A.Konecnikova, I.Kostic, S.Partel, P.Hudek: New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool, The 7th Int’l Conf. on Advanced Semicond. Devices and Microsystems (ASDAM), Smolenice, Slovakia, October 12-16, 2008.
Published in: IEEE Electron Dev. Society.
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M.Rosenauer, M.Spitzbart, S.Zoppel, M.Vellekoop: Ultra Rapid High Quality Prototyping for Optical Microfuidic Analysis Devices, EUROSENSORS 2008, Dresden, Germany, September 7-10, 2008.
Published in: Proc. EUROSENSORS XXII, ISBN 978-3-00-025217-4, Paper Nr. 061, 4 S.

A.Rigler, Ch.Wagner, P.Svasek, A.Jachimowicz, P.Hudek, M.Kraft, M.J.Vellekoop: Improved lamination micromixer with wedge shaped inlet channels for IR spectroscopy, EUROSENSORS 2008, Dresden, Germany, September 7-10, 2008.
Published in: Proc. EUROSENSORS, ISBN 978-3-00-025217-4, pp 577-580.

L.Matay, R.Andok, S.Partel, P.Hudek: Large structured arrays with high pattern density, APCOM 2008, Liptovský Ján, Slovakia, June 25–27, 2008.
Published in: Proc. 4th Int’l Conf. on Applied Physics of Condensed Matter (APCOM 2008), (Session 5B, J.Vajda, M.Weis, M.Vanco, E.Psotka, Editors), ISBN 978-80-227-2902-4, p.142-145.

P.Choleva, S.Partel, R.Mathies: Mikrogalvanik in tiefen SU8 Strukturen, Dornbirner Mikrotechniktage, Dornbirn, Austria, 27-28 May 2008.
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T.Wehlus, T.Hackl, S.Zoppel, J.Edlinger, T.Koerner, H.Karl, W.Brütting, B.Stritzker:
Ultrashort Pulsed Laser Structuring of Garnet Planar Waveguides for Organic-Inorganic Hybride Materials, E-MRS Spring meeting, Strasbourg, France, May 26-30, 2008.

M.Rosenauer, S.Zoppel, M.Vellekoop: A Novel Microfluidic Sensor System Fabricated by SU-8 Femtosecond Pulsed Laser Prototyping, International Spring Seminar on Electronics Technology (ISSE), Budapest, Hungary, May 7-11, 2008.
Published in: Abstract Proceedings - Reliability and Life-time Predition, (2008), ISBN: 978-963-06-4915-5; p. 240-241.

S.Partel, L.Matay, P.Hudek: Hochauflösende Kontaktlithographie, 2-te Forschungsforum der österreichischen Fachhochschulen FHK Wels, Austria, March 26-27, 2008.
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S.Zoppel: Mikrostrukturierung von Dielektrika und Halbleitern mit ultrakurzen Laserpulsen, 2-te Forschungsforum der österreichischen Fachhochschulen FHK Wels, Austria, March 26-27, 2008.
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D.Seyringer: Mikrotechnik-Aktivitäten in Vorarlberg, PLATON Nanophotonics Day 2008, Vienna, Austria, March 28, 2008.

L.Pain, B.Icard, S.Tedesco, B.Kampherbeek, G.Gross, C.Klein, H.Loeschner, E.Platzgummer, R.Morgan, S.Manakli, J.Kretz, C.Hohle, K.-H.Choi, F.Thrum, E.Kassel, W.Pilz, K.Keil, J.Butschke, M.Irmscher, F.Letzkus, P.Hudek, A.Paraskevopoulos, P.Ramm, J.Weber: MAGIC: a European program to push the insertion of maskless lithography, Emerging Lithographic Technologies XII, San Jose, CA, USA, February 26, 2008.
Published in: Proc. SPIE Vol. 6921, Frank M. Schellenberg, Editor (2008) 69211S.

B.Meliorisz, S.Partel, T.Schnattinger, T.Fühner, A.Erdmann, P.Hudek: Investigation of high-resolution contact printing, MNE’07 - 33rd International Conference on Micro- and Nano-Engineering Conference, Copenhagen, Denmark, September 23-26, 2007.
Published in: Microelectronic Engineering 85, Issues 5-6, 744 (2008).
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S.Zoppel, S.Partel, P.Choleva, M.Lederer, G.A.Reider: Selective femtosecond Laser Microstructuring of photoresists and TCO, 26th ICALEO, Orlando, Fl, October 29 – November 1, 2007.
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D.Andrijasevic, W.Smetana, S.Zoppel, W.Brenner: An investigation on development of MEMS in LTCC by embossing technique, 4M 2007 - 3rd International Conference on Multi-Material Micro Manufacture, Borovets, Bulgaria, October 3-5, 2007.
Published in: Proc. of 4M 2007 (Edited by Stefan Dimov, Wolfgang Menz and Yuli Toshev, Organized by: FP6 4M Network of Excellence Whittles Publishing), CRC Press ISBN 978-1904445-53-1, p.143-146 (2007).

S.Partel, S.Zoppel, G.Hairer, G.Stangl, L.Matay, P.Hudek: Development of a high resolution UV contact lithography process for the fabrication of interdigitated electrode arrays, NanoEurope 2007, Fair & Conference, St. Gallen, Switzerland, September 11-13, 2007.
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S.Zoppel, S.Partel, P.Choleva, P.Hudek, H.Huber, M.Lederer, J. Aus der Au, G.A.Reider: Micro structuring of photoresist with femtosecond laser pulses, CLEO Europe 2007 – Conference on lasers and electro-optics, Munich, Germany, June 17-22, 2007.
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S.Zoppel, S.Partel, J.Zehetner, P.Hudek, G.A.Reider: Selective laser ablation of photoresists for MEMs devices, LPM 2007 – 8th International Symposium on Laser Precision Microfabrication, Vienna, Austria, April 23-27, 2007.
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R.Merz, P.Hudek, S.Partel, R.Holly, K.Hingerl, H.Seyringer: Herstellung drei-dimensionaler Siliziumkeile zur optischen Kopplung von Glasfasern und integrierten optischen Wellenleitern, FFH2007, Salzburg, Austria, April 11-12, 2007.
Published in: Erstes Forschungsforum der Österreichischen Fachhochschulen
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J.Nicolics, L.Musiejovsky, J.Steurer, I.Giouroudi, H.Hauser, M.Mündlein, S.Zoppel, J.Zehetner: Laser Welding Process Optimization for the Production of Giant Magnetoimpedance Magnetic Field Sensors

Published in: Sensor Letters, Vol.5, No.1, pp. 204-206 (2007).

P.Hudek, U.Denker, D.Beyer, N.Belic, H.Eisenmann: Fogging effect correction method in high-resolution electron beam lithography, MNE’06 - International Micro- and Nano-Engineering Conference, Barcelona, Spain, September 17-20, 2006.
Published in: Microelectronic Engineering, Vol.84, 814-817 (2007).
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S.Zoppel, H.Huber, G.A.Reider: Selective ablation of thin Mo and TCO films with femtosecond laser pulses for structuring thin film solar cells

Published in: Appl. Phys. A 89(1), 161-163 (2007)

S.Zoppel, J.Zehetner, G.A.Reider: Two color laser ablation: Enhanced yield, improved machining

Published in: Appl. Surf. Scie. 253(19), 7692-7695 (2007)

R.Holly, K.Hingerl, R.Merz, P.Hudek: Fabrication of silicon 3D taper structures for optical fibre to chip interface, MNE’06 - International Micro- and Nano-Engineering Conference, Barcelona, Spain, September 17-20, 2006.
Published in: Microelectronic Engineering 84, 1248-1251 (2007).

V.Wieger, S.Zoppel, E.Wintner: Ultrashort Pulse Laser Osteotomy,

Published in: Laser Physics, ISSN 1054-66X, Vol.17, No.4, pp.438-442 (2007).

D.Andrijasevic, W.Smetana, J.Zehetner, S.Zoppel, W.Brenner: Aspects of micro structuring Low Temperature Cofired Ceramic (LTCC) for realisation complex 3D objects by embossing, MNE’06 - Micro and Nano Engineering Conference, Barcelona, Spain, September 17-20, 2006.
Published in: Microelectronic Engineering, Vol.84(5-8), 1198-1201 (2007)

M.Farsari, G.Filippidis, S.Zoppel, G.A.Reider, C.Fotakis: Micromachining of Silicon Carbide using femtosecond lasers, 8th Conference on laser ablation, Banff, Canada, 2005.
Published in: M Farsari et al 2007 J. Phys.: Conf. Ser. 59 84-87
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S.Zoppel, D.Gray, M.Farsari, R.Merz, G.A.Reider, C.Fotakis: UV-femtosecond laser ablation of SrTiO3 single crystals, 8th Conference on laser ablation, Banff, Canada, 2005.
Published in: S Zoppel et al 2007 J. Phys.: Conf. Ser. 59 610-615
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E.Lausecker, W.Schwinger, I.Bergmair, M.Mühlberger, R.Schöftner, S.Partel, P.Hudek: Fabrication of 4" PDMS stamps and large area sub-µm µCP, Workshop of the Austrian Networks for Nanosciences and Nanotechnology, Danube-University Krems, Austria, November 21-22, 2006.
Published in: WORKSHOP of the AUSTRIAN NETWORKS for NANOSCIENCES and NANOTECHNOLOGY
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S.Zoppel, M.Lederer, J.Smolenski, H.Huber, R.Braunschweig, D.Kopf: Compact Ultrafast Lasers: Thin film structuring for photovoltaic applications, ICALEO 2006 - 25th International Congress on Applications of Lasers Electro-Optics, Scottsdale, Arizona, October 30 – November 2, 2006.
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R.Holly, K.Hingerl, R.Merz, P.Hudek, S.Neve, S.Partel, T.Auer: Fabrication of silicon vertical taper structures for fiber to chip coupler by KOH anisotropic etching, GMe-Workshop 2006 (im Rahmen der Vienna-Tech 2006), Reed Messe Wien, Austria, October 13, 2006.

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P.Hudek, D.Beyer, U.Denker: Writing and exposure optimization in maskless electron beam lithography (Invited presentation), 4th IISB Lithography Simulation Workshop, Hersbruck, Germany, September 29 – October 1, 2006.
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V.Wieger, S.Zoppel, and E.Wintner: Ultra-short pulse laser osteotomy, 15th International Laser Physics Workshop (LPHYS’06), Lausanne, Switzerland, July 24-28, 2006.

S.Zoppel, H.Zehetner, L.Musiejovsky, H.Hauser and J.Nicolics: Laser Micromachining for GMI-Sensors, EMSA 2006 - 6th European Conference on Magnetic Sensors and Actuators, Bilbao, Spanien, June 3-5, 2006.

S.Zoppel, J.Zehetner, G.A.Reider: Two color laser ablation: enhanced yield, improved quality, E-MRS - European Materials Research Society Spring meeting 2006, Nizza, Frankreich, May 29 – June 2, 2006.
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S.Zoppel, S.Partel, J.Nicolics, G.A.Reider, J.Zehetner: Laserablation und ihre Anwendung in der Mikrotechnik, Dornbirner Mikrotechniktage, Dornbirn, Austria, May 30-31, 2006.
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S.Partel, S.Zoppel, P.Hudek, T.Auer , J.Zehetner, W.Smetana , H.Homolka , B.Balluch: Entwicklung zusammenhängender Fertigungsschritte für optische, elektrische und fluidische Mikrosysteme, Dornbirner Mikrotechniktage, Dornbirn, Austria, May 30-31, 2006.
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H.Huber, S.Zoppel, M.Lederer, J.Smolenski, R.Braunschweig, D.Kopf: High Repetition Rate Micromachining of Dielectrics and Ceramics with Ultrafast Lasers (Invited Lecture), PHAST 2006 – Photonic applications system technologies, Long Beach, CA, USA, May 22-25, 2006.

H.Huber, S.Zoppel, J.Zehetner, R.Merz, M.Lederer, W.Seitz, D.Kopf: High Repetition Rate Ultrafast Lasers and their Applications in Micromachining, LAMP 2006 - The 4th International Congress on Laser Advanced Materials, Kyoto, Japan, May 16-19, 2006,

P.Hudek: High-Resolution Patterning in the Micro- and Nano-Technology using Charged Particles (Invited Lecture), Christian Doppler Laboratory of Surface Optics, Institute of Semiconductor and Solid State Physics, Johannes Kepler University Linz, Austria, May 22, 2006.

A.Yousif, M.Strassl, V.Wieger, S.Zoppel, E.Wintner: Oral Applications of Ultra-Short Laser Pulses - a New Approach for Gentle and Painless Treatment?
Published in: Proc. of the SPIE, High Power Laser ablation VI, ISBN 0-8194-6342-6, Vol.6261 (2006).

M.Drzik, H.Loeschner, W.Fallmann, P.Hudek, I.W.Rangelow, Y.Sarov, T.Lalinsky, J.Chlpik: Mechanical characterization of membrane like microelectronic components (Invited Poster), MNE 2005 - 31st Int’l Conf. on Micro- and Nano-Engineering, Vienna, Austria, September 19-22, 2005.
Published in: Microelectronic Engineering 83, p.1036-1042 (2006).
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P.Hudek, D.Beyer: Exposure optimization in high-resolution electron-beam lithography, MNE 2005 - 31st Int’l Conf. on Micro- and Nano-Engineering, Vienna, Austria, September 19-22, 2005.
Published in: Microelectronic Engineering 83,780-783 (2006).

S.Zoppel, M.Farsari, R.Merz, J.Zehetner, G.Stangl, G.A.Reider, C.Fotakis: Laser micro machining of 3C-SiC single crystals, MNE 2005 - 31st Int’l Conf. on Micro- and Nano-Engineering, Vienna, Austria, September 19-22, 2005.
Published in: Microelectronic Engineering 83,780-783 (2006).
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P.Hudek: Hochauflösende Mikrostrukturierung mittels E-Strahl-Lithographie und Trockenätzen (Invited Lecture), Forschungszentrum Karlsruhe GmbH, Institut für Mikrostrukturtechnik, Germany, November 8, 2005.

U.Denker, P.Hudek: Proximity Correction for High Resolution Direct Write, 3rd Int’ Mask Workshop at IMS Chips, Stuttgart, Germany, October 28, 2005.
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S.Zoppel, J.Zehetner, G.A.Reider: Improved picosecond laser ablation with second harmonic seeding, 5th International Conference on Photonics, Devices and Systems, Prague, Czech Republic, June 8-11, 2005.
Published in: Proceedings of SPIE, the International Society for Optical Engineering ISSN 0277-786X CODEN PSISDG.

J.Zehetner, T.Auer, H.Duelli, P.Hudek, R.Merz, S.Neve, S.Partel, H.Wadlegger, S.Zoppel G.Stangl: Laserbearbeitung am Forschungszentrum Mikrotechnik der FH Vorarlberg, Dornbirner Mikrotechniktage, Dornbirn, Austria, March 22-23, 2005.
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P.Hudek: Elektronenstrahl Lithographie - Nanostrukturierung mit Optimierung (Invited Lecture), ARC Seibersdorf Research GmbH, Nano-Systemtechnologien, Tech Gate Vienna, February 28, 2005.

J.Zehetner, S.Zoppel, R.Merz, H.Huber: Neue Pikosekundenlaserkonzepte und ihre Anwendungen, Laser in der Elektronikproduktion & Feinwerktechnik, Tagungsband: LEF 2005, Hrsg.: M.Geiger, S.Polster, Meisenbach, Bamberg, 2005.

M.Farsari, G.Filippidis, S.Zoppel, G.A.Reider and C.Fotakis: Efficient femto second laser micromachining of bulk 3C-SiC
Published in: J. Micromech. Microeng. 15, p.1786-1789 (2005).

S.Zoppel, R.Merz, J.Zehetner, G.A.Reider: Enhancement of laser ablation yield by two color excitation
Published in: Applied Physics A 81, 847-850 (2005).

S.Zoppel, D.Gray, M.Farsari, R.Merz, G.A.Reider, C.Fotakis: Elimination of cracking during UV laser ablation of SrTiO3 single crystals by employing a femto second laser
Published in: Applied Surface Science 252, 1910-1914, (2005).

D.Beyer, P.Hudek, O.Fortagne, T.Groves, J.Gramss: Writing Nano-Imprint Templates by Shaped E-beam Lithography, 3rd International Conference on Nanoimprint und Nanoprint Technology, Vienna, Austria, December 2004.
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G.Stangl, G.A.Reider, S.Zoppel, W.Friza, A.Jarisch: Overview on Ablation Techniques at wavelengths of 193 and 248 nanometers, 7th International Conference on Laser Ablation, Kreta, Greece, October 2003.